Background
As the semiconductor industry continues to make new advances in material development, the synthesis of photoreversible polymers for bond-debond applications is of particular interest. These materials typically have strong adhesive properties in the semiconductor manufacturing process, but adhesive strength can effectively be turned off using light at specific reversal wavelength for debonding steps. Additionally, water dispersibility after photocleavage of the polymer chains is of particular interest in the semiconductor field. These polymers may be employed in semiconductor chip manufacturing processes as sacrificial materials.
Invention Description
Researchers at Arizona State University and Intel Corporation have developed photoreversible cyclobutene-containing polymers that may exhibit water dispersibility after photo cleavage. Specifically, cyclobutene from functionalized coumarin dimers offer opportunities as photoreversible sites in polymer chains. The incorporation of functional coumarin monomers into polymers enables photoresponsive polymers that lose molecular weight, thus reducing mechanical properties among UVC radiation. Novel chemistries allow for modification of polymer performance and solubilities properties when exposed to specific wavelengths of light. This technology can be used in the manufacturing process that involves bond-debonding steps. Water solubility or dispersity of the debonded material is useful in moving away from harsh chemicals to clean material residues.
Potential Applications:
- Semiconductor chip manufacturing industry
- Optoelectronics and photonic materials
- Clean manufacturing technologies
Benefits and Advantages:
- Produces a higher photoreversibility yield
- Faster response times
- Sustainable