Semiconductors, Materials & Processes

Physical Unclonable Functions with Silicon-Rich SiOx Dielectric Devices

Plasma-Based Edge Terminations for GaN Power Devices

Regrown p-GaN by Metalorganic Chemical Vapor Deposition (MOCVD) for GaN Vertical-Channel Junction Field-Effect Transistors (VCJFETs)

Polymeric Mac-Imprint Stamp Materials for High-Density Defect-Free Patterning of Semiconductors

Smart Interposer Technology for Electrically Reconfigurable Operation

Highly Efficient Chiral Plasmonic Metasurfaces for Mid-Infrared Polarization Filtering and Detection

Low-Temperature Synthesis of Single-Crystal Films on Amorphous Substrates

Low-Temperature Synthesis of Thin Films with Tailored Grain Size, Texture, and Phase Composition

Enhanced Electrodeposit Growth Rate in Oxide-Based Lateral Programmable Metallization Cell Devices

Reconstructing Charge Collection Efficiency in Three Dimensions