Semiconductors, Materials & Processes
Physical Unclonable Functions with Silicon-Rich SiOx Dielectric Devices
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Plasma-Based Edge Terminations for GaN Power Devices
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Regrown p-GaN by Metalorganic Chemical Vapor Deposition (MOCVD) for GaN Vertical-Channel Junction Field-Effect Transistors (VCJFETs)
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Polymeric Mac-Imprint Stamp Materials for High-Density Defect-Free Patterning of Semiconductors
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Smart Interposer Technology for Electrically Reconfigurable Operation
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Highly Efficient Chiral Plasmonic Metasurfaces for Mid-Infrared Polarization Filtering and Detection
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Low-Temperature Synthesis of Single-Crystal Films on Amorphous Substrates
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Low-Temperature Synthesis of Thin Films with Tailored Grain Size, Texture, and Phase Composition
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Enhanced Electrodeposit Growth Rate in Oxide-Based Lateral Programmable Metallization Cell Devices
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Reconstructing Charge Collection Efficiency in Three Dimensions
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